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曲线面罩的隐性函数表征,以实现参数光学近距离校正与邻近平行标题搜索
Applied optics
|September 14, 2023
概括
这项研究引入了曲线面罩光学近距离校正 (OPC) 的新参数方法,显著降低了计算复杂性和设计时间. 这种方法通过优化面具图案,比传统基于像素的方法更有效地提高了光刻分辨率.
科学领域:
- 半导体制造业 半导体制造业
- 石版印刷技术的技术
- 计算光学是一种计算光学.
背景情况:
- 与直线面具相比,曲线面具结构提供了更高的光刻分辨率,可以在关键的技术节点进行精确的轮校正.
- 传统的基于像素的反向优化用于曲线面罩光学近距离校正 (OPC) 是计算密集的,需要大量的数据存储.
- 曲线面罩设计的复杂性阻碍了在半导体制造中有效地实施OPC.
研究的目的:
- 为曲线面罩开发一个计算效率高的OPC方法.
- 为了缩短曲线面具设计的研发周期.
- 为了提高图像保真度在石版使用优化曲线面具图案.
主要方法:
- 提出了一个隐式函数以最小参数表示多种曲线类型,将OPC问题转换为低维搜索.
- 使用 tabu 搜索算法与邻近并行计算相结合,以快速优化面具模式参数.
- 开发了对曲线面罩OPC的参数方法,远离基于高维像素的优化.
主要成果:
- 与直线OPC相比,参数曲线OPC方法显示出更高的图像保真度.
- 在计算复杂性和设计数据存储要求方面实现了显著的减少.
- 成功地解决了传统的像素曲线面具OPC的局限性,包括计算成本和可制造性问题.
结论:
- 拟议的参数曲线OPC方法为高级光刻提供了更高效和有效的解决方案.
- 这种方法促进了更快的研发周期,并改善了复杂的面具设计的可制造性.
- 隐含的函数表示和高效的搜索算法是克服曲线面具OPC的挑战的关键.
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