基 (H*) 与过渡金属化物之间的化学相互作用
Abdul Rehman1, Robbert W E van de Kruijs1, Wesley T E van den Beld1
1Industrial Focus Group XUV Optics, MESA+ Institute for Nanotechnology, University of Twente, Drienerlolaan 5, Enschede 7522NB, Netherlands.
本研究研究了在反应性环境中的过渡金属化物 (TMN). 我们在TMN薄膜中发现了不同的可还原性,其中一些显示表面减少,而另一些显示显著的地下脱化.
科学领域:
- 材料科学 材料科学 材料科学
- 表面化学 表面化学
- 薄膜技术 薄膜技术
背景情况:
- 过渡金属化物 (TMN) 作为反应性环境中的保护涂层至关重要.
- 虽然通过TMN透被理解,但它们通过原子 (H*) 的可还原性较少被探索.
研究的目的:
- 在高温下对H*与各种过渡金属化物薄膜的相互作用进行分类.
- 研究TMN中H*诱导的减少和脱的机制和程度.
主要方法:
- 暴露于环境中的TiN,ZrN,HfN,VN,NbN和TaN薄膜在700°C时暴露于H*的暴露.
- 分析表面和地下变化,包括脱化和过渡金属氧化物形成.
- 开发一个三步模型 (化,挥发性物种形成,扩散) 来解释观察到的相互作用.
主要成果:
- 对于TiN和VN,H*诱导的减少是局限于表面 (≈2 nm).
- ZrN和HfN表现出显著的地下脱化和过渡金属氧化物 (TMO) 分数的增加.
- 与ZrN和HfN相比,NbN和TaN显示出与TMO增加较少的脱化.
结论:
- 通过首选的化途径和挥发性物种形成 (NH3和H2O) 的热力学驱动因素,可以预测H*与部分氧化TMN的相互作用.
- 一个涉及化,挥发性物种形成和地下扩散的模型有效地解释了TMN中观察到的可还原性模式.
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