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允许在地表多光子 lithography 的高精度梯度指数控制

Alexander J Littlefield^1,2, Dajie Xie^3,4,5, Corey A Richards^3,4,5

¹Department of Electrical and Computer Engineering, University of Illinois Urbana-Champaign, Urbana, Illinois 61801, United States.

ACS photonics

|September 25, 2023

概括

研究人员使用多光子光刻法改进了地下微光学制造. 这种新方法显著提高了3D光学元件的折射率均性和范围,使得更精确和可靠的光学设备的创建成为可能.

科学领域:

材料科学材料科学材料科学
光学和光子学在光学和光子学.
纳米技术纳米技术

背景情况:

在半孔宿主中的多光子光刻法使3D光学元件制造具有可调节的折射率.
以前的方法受到光电阻值附近的灵敏度的限制,限制了可实现的折射率范围和均性.

研究的目的:

为了提高统一性和扩大可靠的折射率范围,通过多光子光刻法制造的地下微光学.
为了克服先前技术的局限性,敏感于接近光电阻值的暴露剂量.

主要方法:

实施了三个关键的修改:校准仪写字段,采用压力模位,并强制执行侧面截面之间的恒定时间.
这些技术解决了大规模的光学偏差,小规模的写作错误和写作深度的变化.
利用一个半孔主体来制造具有精确控制折射率的光学元件.

主要成果:

显著增加可靠的折射率范围从0.12到0.37,标准偏差 (SD) 在值下降从0.13到0.0021.
在多孔中实现了精确的光学制造,其指数从n = 1.20到1.57 (SD < 0.012) 在多孔中.
与对照组相比,制造的2D线网格和梯度指数镜头的性能得到了改善.

结论:

开发的多光子光刻法为3D微光学提供了前所未有的对折射率均性和范围的控制.
这一进步使能够精确制造具有增强性能特性的先进光学元件.
改进的技术对创建复杂的光学设备和系统具有广泛的影响.

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