在无形氧化物记忆器中,通过缺陷重组逐渐调节导电量
Siqin Li1, Jigang Du2, Bojing Lu1
1State Key Laboratory of Silicon and Advanced Semiconductor Materials, School of Materials Science and Engineering, Zhejiang University, Hangzhou 310058, China. yezz@zju.edu.cn.
Materials horizons
|September 27, 2023
概括
无形ZnAlSnO记忆体表现出可靠的无成形运行. 氧空位动态控制着逐渐的导电量调节和光线形成,为未来的memristor设计提供了洞察力.
科学领域:
- 材料科学 材料科学 材料科学
- 纳米技术纳米技术
- 固态电子 固态电子
背景情况:
- 由于可调节的非静态度,无形氧化物为先进的记忆器提供了潜在的潜力.
- 了解这些材料中的记忆机制,特别是电阻切换,仍然是一个挑战.
研究的目的:
- 为了研究无形ZnAlSnO记忆器中的电阻切换机制.
- 阐明氧气空缺在导电量调制和光线演变中的作用.
主要方法:
- 无成形无形ZnAlSnO记忆体的制造.
- 使用脉冲减压和ex situ传输电子显微镜 (TEM) 进行表征.
- 对导电丝残余和跳跃导电机制的分析.
主要成果:
- 观察到高可重现性和初始低电阻状态.
- 在RESET期间的对数指数放松归因于氧空位扩散.
- 通过氧气空位聚合形成的残余导电丝的识别.
- 导电性超过跳跃导电性;费米水平解释了高电阻状态衰变.
- 设备故障涉及黄金纳米集群的形成由于Au迁移.
结论:
- 氧空位重组是无形ZnAlSnO的记忆性行为的关键.
- 该研究提供了对缺陷演变及其对设备性能影响的全面了解.
- 这些发现为设计下一代memristor提供了新的策略.
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