黑场效应晶体管通过局部焦尔加热改善了接触
Fangyuan Shi1, Shengguang Gao1, Qichao Li1
1National Key Laboratory of Advanced Micro and Nano Manufacture Technology, Key Laboratory for Thin Film and Microfabrication of Ministry of Education, School of Electronic Information and Electrical Engineering, Shanghai Jiao Tong University, Shanghai 200240, China.
Nanomaterials (Basel, Switzerland)
|September 28, 2023
概括
局部化的朱尔加热改善了二维黑场效应晶体管 (BP-FET) 中的电接触. 这种方法通过在黑色/黄金电极接口上形成黄金化物来提高设备的性能,从而提高导电性.
科学领域:
- 材料科学 材料科学 材料科学
- 凝聚物质物理学 凝聚物质物理学
- 纳米技术 纳米技术
背景情况:
- 由于其独特的电子特性,二维黑 (BP) 是场效应晶体管 (FET) 的一个有前途的材料.
- 实现高性能BP-FET需要BP和金属电极之间的可靠,低电阻接触.
研究的目的:
- 调查局部焦尔加热的使用,以改善2D BP和金电极之间的接触.
- 通过优化电气接触来提高BP-FET的性能.
主要方法:
- 在2D BP/黄金电极接口上应用了局部化的朱尔加热方法.
- 应用源-排水电压来诱导局部加热,并研究其对设备特性的影响.
- 在加热前后进行了电气测量,包括电流-电压 (I-V) 曲线和零偏差导电量.
主要成果:
- 局部化的朱尔加热显著改善了接触,使零偏差导电量增加了大约五个数量级.
- 电流-电压曲线变得更加线性,表明接触电阻降低.
- 在BP/黄金界面形成黄金化物被确定为接触改善的机制.
- 制造的BP-FET表现出4850的高开/关比,并改善了现状导电性.
结论:
- 局部焦耳加热是一种有效的方法,用于在2D BP设备中创建低电阻接触.
- 这种技术显著提高了黑场效应晶体管的性能.
- 这些发现为开发基于二维黑的高性能电子设备提供了途径.
相关概念视频
Field Effect Transistor
454
Field-effect transistors (FETs) are integral to electronic circuits and distinguished by their three-terminal setup: the gate, drain, and source. These transistors operate as unipolar devices, which utilize either electrons or holes as charge carriers, in contrast to bipolar transistors, which use both types of carriers. The primary function of the FET is to modulate the flow of these carriers from the source to the drain through a channel. The voltage difference between the gate and source...
454
Biasing of FET
305
Biasing a Junction Field Effect Transistor (JFET) is crucial for setting operational parameters and ensuring efficient functioning in electronic circuits. JFETs are characterized by using a single carrier type in N-channel or P-channel configurations, where the channel is surrounded by PN junctions. These junctions are central to the device's ability to control current flow.
In an N-channel JFET, the structure consists of N-type material forming the channel on a P-type substrate, with the...
In an N-channel JFET, the structure consists of N-type material forming the channel on a P-type substrate, with the...
305
P-N junction
559
A p-n junction is formed when p-type and n-type semiconductor materials are joined together. At the interface of the p-n junction, holes from the p-side and electrons from the n-side begin to diffuse into the opposite sides due to the concentration gradient. This diffusion of carriers leads to a region around the junction where there are no free charge carriers, known as the depletion region. The charge density within the depletion region for the n-side and p-side can be described by the...
559
Bipolar Junction Transistor
798
Bipolar Junction Transistors (BJTs) are essential elements in electronic circuits, playing a crucial role in the functionality of amplifiers, memories, and microprocessors. These transistors can be designed as NPN or PNP based on their doping patterns. They consist of three layers: the emitter, base, and collector. The configuration of these layers and their respective doping levels—with N-type or P-type impurities—define the transistor's type and its operational...
798
Metal-Semiconductor Junctions
373
The contact of metal and semiconductor can lead to the formation of a junction with either Schottky or Ohmic behavior.
Schottky Barriers
Schottky barriers arise when a metal with a work function (Φm) contacts a semiconductor with a different work function (Φs). Initially, electrons transfer until the Fermi levels of the metal and semiconductor align at equilibrium. For instance, if Φm > Φs, the semiconductor Fermi level is higher than the metal's before contact. The...
Schottky Barriers
Schottky barriers arise when a metal with a work function (Φm) contacts a semiconductor with a different work function (Φs). Initially, electrons transfer until the Fermi levels of the metal and semiconductor align at equilibrium. For instance, if Φm > Φs, the semiconductor Fermi level is higher than the metal's before contact. The...
373
Biasing of P-N Junction
578
The operation of a p-n junction diode involves various biasing conditions, including forward bias, reverse bias, and equilibrium.
In equilibrium, no external voltage is applied across the p-n junction. The depletion region is formed at the junction interface due to the diffusion of carriers, which leaves behind charged dopants, acceptors on the p-side, and donors on the n-side. These immobile charges create an electric field that prevents further diffusion of carriers. The related energy band...
In equilibrium, no external voltage is applied across the p-n junction. The depletion region is formed at the junction interface due to the diffusion of carriers, which leaves behind charged dopants, acceptors on the p-side, and donors on the n-side. These immobile charges create an electric field that prevents further diffusion of carriers. The related energy band...
578


