垂直道FET与Ge / Si无兴奋剂异质连接,数字应用的高性能开关
Iman Chahardah Cherik1, Saeed Mohammadi2, Subir Kumar Maity3
1Department of Electrical and Computer Engineering, Semnan University, Semnan, 3513119111, Iran.
Scientific reports
|October 5, 2023
概括
这项研究引入了一种新型的无兴奋剂垂直道场效应晶体管 (TFET),具有增强的静电控制. 拟议的TFET表现出卓越的性能指标,使其适用于直流 (DC) 和射频 (RF) 应用.
科学领域:
- 半导体设备物理学的物理
- 材料科学是一种材料科学.
背景情况:
- 传统的晶体管在扩展和功率效率方面存在局限性.
- 道场效应晶体管 (TFET) 为低功耗电子产品提供了潜在的解决方案.
研究的目的:
- 介绍一种新型的无兴奋剂垂直道异质连接场效应晶体管 (TFET).
- 优化TFET的静电控制,并研究其在各种非理想条件下的性能.
- 评估TFET适用于静态随机存取内存 (SRAM) 电路的适用性及其DC/RF应用潜力.
主要方法:
- 使用Silvaco ATLAS进行数值模拟,并与实验数据进行校准.
- 调查非理想性,包括陷辅助道挖掘,接口陷电荷和双极导电.
- 对负电容材料集成进行评估,以改善开关特性.
- 用于6T SRAM电路的n通道和p通道设备的制造和表征.
主要成果:
- 拟议的垂直TFET表现出优化的静电控制,由于双门配置和氧化门.
- 性能指标包括34.4μA/μm的高启动电流 (Ion),7.17 × 107的优异的开/关比 (Ion/Ioff),以及123 GHz的高传输频率 (fT).
- 对非理想性的分析证实了设备的可靠运行.
- 将其集成到6T SRAM电路中显示出有希望的读写静态噪声边缘 (SNM) 性能.
结论:
- 无兴奋剂的垂直TFET代表了TFET技术的重大进步.
- 该设备表现出卓越的性能和稳定性,使其成为未来低功率直流和高频射频应用的强有力的候选人.
- 集成到SRAM电路中突出了其在高性能内存应用中的潜力.
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