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基于p-GaN的接触器及其在激光二极管中的应用
Iryna Levchenko1, Serhii Kryvyi2,3, Eliana Kamińska1
1Institute of High Pressures Physics, Polish Academy of Sciences, 01-142 Warsaw, Poland.
在N2 + O2气中优化 (Pd) 接触厚度和化,可以提高p-GaN设备的电性能. 这减少了接触电阻,这对于高效的激光二极管 (LD) 来说至关重要.
科学领域:
- 材料科学 材料科学 材料科学
- 半导体物理 半导体物理
- 电气工程 电气工程
背景情况:
- 在p型化 (p-GaN) 上的 (Pd) / (Ni) /金 (Au) 接触对光电子设备至关重要.
- 了解处理参数对接触性能的影响对于设备性能至关重要.
研究的目的:
- 为了研究厚度和热处理大气对Pd/Ni/Au/p-GaN金属接触者的影响.
- 确定实现低电阻接触和可靠设备操作的最佳条件.
主要方法:
- 制造具有不同Pd厚度的Pd/Ni/Au/p-GaN结构.
- 在N2和N2+O2大气中进行化研究.
- 接触形态,接口微观结构和电特性 (I-V特性) 的表征.
- 在激光二极管 (LD) 中集成优化接触.
主要成果:
- 随着存储的接触显示非线性IV特征.
- 化N2降解了微观结构,导致Ga的扩散和空隙.
- N2 + O2回火改善粘附性并降低阻力,但可以诱导GaN分解.
- 通过增加Pd厚度和N2 + O2.2中的化来实现低接触电阻 (≈1 × 10^-4 Ω cm2).
- 增加Pd厚度导致空洞形成.
结论:
- 优化 Pd 厚度和 N2 + O2 化是 p-GaN 上基于 Pd 的低电阻接触器的关键.
- 优化接触使得激光二极管在4.1V和3.3kA/cm2时能够有效运行.
- 需要仔细控制回火条件,以平衡性能改进和微观结构退化.
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