基于内平面NbSe2/MoSe2/NbSe2异质连接的亚-9纳米高性能和低功耗晶体管
Zeng-Lin Cao1, Xiao-Hui Guo1, Kai-Lun Yao1
1School of Physics and Wuhan National High Magnetic Field Center, Huazhong University of Science and Technology, Wuhan 430074, People's Republic of China. linzh@hust.edu.cn.
Nanoscale
|October 17, 2023
概括
这项研究探讨了在平面内2D/2D异质连接的场效应晶体管 (FET). 优化的亚-9纳米门长度实现高性能和低功耗,满足未来的半导体需求.
科学领域:
- 材料科学 材料科学 材料科学
- 凝聚物质物理学 凝聚物质物理学
- 纳米技术纳米技术
背景情况:
- 二维 (2D) 半导体材料提供了将场效应晶体管 (FET) 扩展到10nm以下门长度的潜力.
- 与垂直的范德瓦尔斯异质连接装置相比,在平面上的2D/2D异质连接FET的探索较少.
研究的目的:
- 调查NbSe2/MoSe2/NbSe2在平面上的异质连接FET的运输特性.
- 评估不同门长度对设备性能的影响.
主要方法:
- 使用了初始量子运输模拟.
- 分析了NbSe2/MoSe2/NbSe2异质连接的运输特性.
主要成果:
- 门的长度低于9纳米,导致低次值波动 (62mV dec−1).
- 实现了1040μA μm-1.1的高状态电流.
- 优化的通道长度设备接近或超过了半导体国际技术路线图 (ITRS) 对高性能和低功耗的要求.
结论:
- 在平面内NbSe2/MoSe2/NbSe2异质连接的FET显示出未来电子设备的前景.
- 这些发现为在后穆尔时代设计平面内异质连接电气装置提供了指导.
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