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用Sb₂S₃与聚N-乙烯基碳酸进行共价功能化,用于固态宽带激光保护

Guangwei Li¹, Ningning Dong^2,3, Xinzhu Wang⁴

¹Key Laboratory for Advanced Materials, Institute of Applied Chemistry, East China University of Science and Technology, 130 Meilong Road, Shanghai 200237, China. 3148704620@qq.com.

Chemical communications (Cambridge, England)

|October 18, 2023

概括

在PMMA中嵌入了一种新型的硫化聚 ((N-vinylcarbazole) (Sb2S3-PVK) 纳米材料,提供了卓越的光学限制性能. 这种先进的材料显示出在可见和近红外范围内提供宽带激光保护的前景.

科学领域:

材料科学材料科学材料科学
纳米技术纳米技术
光电学是指光电子产品.

背景情况:

二维 (2D) 纳米材料需要更广泛的应用程序的增强光学限制能力.
开发复杂的多元件纳米材料系统是提高光学限制性能的关键.

研究的目的:

合成一种高度溶解的多-乙烯基碳酸-硫化物 (Sb2S3-PVK) 纳米材料.
将Sb2S3-PVK嵌入到用于光学限制应用的聚甲基酸 (PMMA) 矩阵中.
为了评估Sb2S3-PVK/PMMA复合膜的光学限制性能.

主要方法:

使用硫化-[S-1-dodecyl-S'-(α,α'-dimethyl-α''-acetic acid) trithiocarbonate] (Sb2S3-DDAT) 作为可逆添加碎片化链转移 (RAFT) 剂合成Sb2S3-PVK.
将合成的Sb2S3-PVK嵌入PMMA矩阵中,以创建一个复合膜.
在N2.2中,在200°C的烧焦前和之后,光学限制性能的表征.

主要成果:

与Sb2S3/PMMA和Sb2S3:PVK混合物相比,Sb2S3-PVK/PMMA薄膜表现出优越的光学限制性能.
化显著改善了非线性吸收系数,并降低了532nm和1064nm的限制值.
化后的值显示了增强的性能:478.04厘米GW−1和1.70J厘米−2在532nm;520.92厘米GW−1和1.40J厘米−2在1064nm.

结论:

这种Sb2S3-PVK/PMMA复合材料具有出色的光学限制性能.
该材料展示了作为可见和近红外波长的宽带激光保护器的潜力.
优化纳米材料设计对于推进光学限制应用至关重要.

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