在旋转涂层过程中进行现场X射线散射的紧样本环境
Ekaterina Kneschaurek1, Alexander Hinderhofer1, Bernd Hofferberth1
1Institute of Applied Physics, University of Tübingen, 72076 Tübingen, Germany.
The Review of scientific instruments
|October 20, 2023
概括
我们开发了一个紧的系统,用于实时薄膜结晶研究,使用同步 X射线衍射. 这种设置可以在现场监测薄膜生长和退火过程,并进行精确的环境控制.
科学领域:
- 材料科学 材料科学 材料科学
- 晶体学 晶体学是指结晶学.
- 薄膜技术 薄膜技术
背景情况:
- 在现场研究薄膜结晶动力学对于理解材料特性至关重要.
- 现有的设置往往缺乏对沉积,回火和大气条件的综合控制.
研究的目的:
- 为了展示一个紧的,多功能样本环境在现场基于同步的薄膜结晶研究.
- 为了实现在受控大气条件下实时监测薄膜生长动态.
主要方法:
- 草地发射X射线衍射 (GIXRD) 用于现场结构分析.
- 集成的旋转涂层,自动沉积和红外线回火阶段.
- 差反射光谱用于厚度和光学属性监测.
- 湿度和氧气传感器用于大气控制.
主要成果:
- 该系统成功地监测了甲基氧化 (MAPbI3) 矿薄膜的结晶路径.
- 已证明低振荡幅度旋转涂层 (∼3μm) 适用于抗溶剂应用.
- 已验证的远程控制功能用于同步光线线集成.
结论:
- 开发的样本环境有助于对薄膜结晶的现场全面调查.
- 集成的功能允许精确控制和实时分析薄膜生长过程.
- 这种设置对于优化薄膜沉积技术和理解材料相位过渡有价值.
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