二维HfS2-ZrS2横向异质连接FET具有高整形性和光电流
Lin Li1,2, Peize Yuan1, Zinan Ma1
1School of Physics, Henan Key Laboratory of Infrared Materials & Spectrum Measures and Applications, Henan Normal University, Xinxiang, Henan 453007, China. lxpslxhhw@126.com.
Nanoscale
|October 25, 2023
概括
本研究引入了一种新的场效应晶体管 (FET),使用HfS2-ZrS2横向异质连接. 该设备集成了整正和光检测功能,为小型光电子纳米设备铺平了道路.
科学领域:
- 材料科学 材料科学 材料科学
- 纳米技术 纳米技术
- 凝聚物质物理学 凝聚物质物理学
背景情况:
- 微型,多功能设备对于集成电路至关重要.
- 散装材料在创建紧,全合一系统方面面临限制.
研究的目的:
- 设计一种场效应晶体管 (FET),能够同时进行校正和光检测.
- 探索单层横向异质连接对集成光电子功能的潜力.
主要方法:
- 使用单层HfS2-ZrS2横向异质连接器制造一个场效应晶体管 (FET).
- 在可见光光谱中对设备的电气和光响应特性进行表征.
主要成果:
- HfS2-ZrS2侧向异质连接FET表现出同时纠正行为和光检测.
- 实现了高的整正比率~10^12,光电流密度为13.3 nA m^-1,响应率为57 mA W^-1,灭比率为108.
- 在负门电压下,与双门FET相比,在单门FET中观察到更高的纠正比率.
结论:
- 基于单层横向异构连接的FET提供了一个可行的途径,用于将多个功能集成到单个纳米设备中.
- 这种方法促进了紧和高效的光电子系统的发展.
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