通过300kV的传输电子显微镜对的可用样品厚度进行实验评估,用于晶格成像
Keita Kobayashi1, Ryosuke Kizu1
1National Metrology Institute of Japan (NMIJ), National Institute of Advanced Industrial Science and Technology (AIST), 1-1-1, Higashi, Tsukuba 305-8565, Japan.
Ultramicroscopy
|October 27, 2023
概括
传输电子显微镜 (TEM) 的样本受厚度的限制. 为了清晰的格子成像和准确的校准,样本厚度应低于大约500纳米以获得最佳结果.
科学领域:
- 材料科学 材料科学 材料科学
- 固态物理 固态物理
- 电子显微镜电子显微镜
背景情况:
- 使用传输电子显微镜 (TEM) 精确的结构分析依赖于高质量的晶格图像.
- 晶 (Si) 样本用于晶格成像的可用厚度是可靠数据采集的关键参数.
研究的目的:
- 为了确定用于格子成像的的最大可用的样品厚度.
- 为了评估样品厚度对格子图像质量和对比度的影响.
- 建立使用参考材料进行TEM放大校准的实用指南.
主要方法:
- 使用一个配备CMOS摄像头的300kVTEM.
- 使用原始参考材料 (RM) 与不同厚度的图案.
- 获取并比较不同厚度的Si {111} 平面的格子图像.
主要成果:
- Si {111} 平面的格子图像成功地获得了高达508 nm的厚度.
- 图像对比度在508nm显著下降,需要较长的曝光时间 (5.0秒) 与较薄的样本相比 (0.5秒为<=316nm).
- 在较厚的标本中,明显的格子边缘可见性受到损害.
结论:
- 通过晶格成像对晶进行精确的结构分析和TEM放大校准的实用厚度极限在指定的实验条件下大约为500nm.
- 较厚的标本 (> 500 nm) 降低了对比度和清晰度,影响了数据可靠性.
- 优化样本准备对于高分辨率的TEM应用至关重要.
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