一个具有浮动p区域的新型超级连接点DT-MOS,以提高短路性
Sujie Yin1, Wei Cao1, Xiarong Hu2
1School of Electrical Engineering, Southwest Jiaotong University, Chengdu 611756, China.
Micromachines
|October 28, 2023
概括
一个新的超级连接双槽 MOSFET 提供了更好的故障电压和电阻. 这种设计增强了短路能力,并降低了门电荷,而不会增加制造复杂度.
科学领域:
- 半导体设备物理 半导体设备物理
- 电力电子 电力电子 电力电子
背景情况:
- 金属氧化物半导体场效应晶体管 (MOSFET) 在功率电子中至关重要.
- 优化故障电压 (BV) 和特定电阻 (R_on,sp) 之间的权衡是一个关键的挑战.
研究的目的:
- 提出和研究一个新的超级连接 (SJ) 双沟 MOSFET (DT-MOS).
- 为了评估其静态和动态性能,故障电压,电阻和短路能力.
主要方法:
- 使用Synopsys Sentaurus TCAD进行设备模拟.
- 分析静态性能,故障电压,特定启动电阻和短路承受时间 (t_sc).
- 评估道排水负载 (Q_gd) 和道排水容量 (C_gd).
主要成果:
- 拟议的SJ DT-MOS展示了BV和R_on,sp.之间的一个优秀的妥协.
- 在短路条件下,特定区域的耗尽增加了短路能力.
- 与其他设计相比,该设备显示最低Q_gd和C_gd.
- 超级连接结构改善了短路承受时间 (t_sc).
结论:
- 新的SJ DT-MOS实现了卓越的静态和动态性能,以及增强的短路能力.
- 该设计提供了一个平衡的性能配置文件,没有增加的过程复杂性.
- 这种MOSFET适用于在各种操作条件下要求高可靠性的应用.
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