Jove
Visualize
联系我们

相关概念视频

MOS Capacitor01:25

MOS Capacitor

812
A Metal-Oxide-Semiconductor (MOS) capacitor is a fundamental structure used extensively in semiconductor device technology, particularly in the fabrication of integrated circuits and MOSFETs (metal-oxide-semiconductor field-effect transistors). The MOS capacitor consists of three layers: a metal gate, a dielectric oxide, and a semiconductor substrate.
The metal gate is typically made from highly conductive materials such as aluminum or polysilicon. Beneath the metal gate lies a thin layer of...
812
Field Effect Transistor01:29

Field Effect Transistor

438
Field-effect transistors (FETs) are integral to electronic circuits and distinguished by their three-terminal setup: the gate, drain, and source. These transistors operate as unipolar devices, which utilize either electrons or holes as charge carriers, in contrast to bipolar transistors, which use both types of carriers. The primary function of the FET is to modulate the flow of these carriers from the source to the drain through a channel. The voltage difference between the gate and source...
438
P-N junction01:11

P-N junction

545
A p-n junction is formed when p-type and n-type semiconductor materials are joined together. At the interface of the p-n junction, holes from the p-side and electrons from the n-side begin to diffuse into the opposite sides due to the concentration gradient. This diffusion of carriers leads to a region around the junction where there are no free charge carriers, known as the depletion region. The charge density within the depletion region for the n-side and p-side can be described by the...
545
Biasing of FET01:22

Biasing of FET

289
Biasing a Junction Field Effect Transistor (JFET) is crucial for setting operational parameters and ensuring efficient functioning in electronic circuits. JFETs are characterized by using a single carrier type in N-channel or P-channel configurations, where the channel is surrounded by PN junctions. These junctions are central to the device's ability to control current flow.
In an N-channel JFET, the structure consists of N-type material forming the channel on a P-type substrate, with the...
289
Metal-Semiconductor Junctions01:24

Metal-Semiconductor Junctions

355
The contact of metal and semiconductor can lead to the formation of a junction with either Schottky or Ohmic behavior.
Schottky Barriers
Schottky barriers arise when a metal with a work function (Φm) contacts a semiconductor with a different work function (Φs). Initially, electrons transfer until the Fermi levels of the metal and semiconductor align at equilibrium. For instance, if Φm > Φs, the semiconductor Fermi level is higher than the metal's before contact. The...
355
Characteristics of MOSFET01:17

Characteristics of MOSFET

398
Metal-oxide-semiconductor field-effect Transistors, or MOSFETs, play a critical role in electronic circuits. They are primarily utilized for amplifying and switching signals.
Various vital parameters influence their functionality, which is crucial for theory and electronics applications. First, channel dimensions, precisely length, and width, are pivotal. The size of these channels affects the transistor's ability to carry current and switching speeds; shorter channels typically enable...
398

您也可能阅读

相关文章

通过共同作者、期刊和引用图与本文相关的文章。

排序
Same author

Polarization Engineering of Second-Harmonic Generation in 3R-MoS<sub>2</sub> Waveguides.

Nano letters·2026
Same author

Transfer and beyond: emerging strategies and trends in two-dimensional material device fabrication.

Chemical Society reviews·2026
Same author

Direct Synthesis of Atomically Smooth Epitaxial PbI<sub>2</sub> Nanosheets for Low-Threshold Monolithic Spin Lasers.

Journal of the American Chemical Society·2025
Same author

Counter-propagating entangled photon pairs from monolayer GaSe.

Nature communications·2025
Same author

Dynamic control of nonlinear emission by exciton-photon coupling in WS<sub>2</sub> metasurfaces.

Science advances·2025
Same author

Stacking Mode-Driven Enhancement of Optoelectronic and Electrocatalytic Properties in Bilayer 2H MoS<sub>2</sub>.

ACS applied materials & interfaces·2025
JoVE
x logofacebook logolinkedin logoyoutube logo
关于 JoVE
概览领导团队博客JoVE 帮助中心
作者
出版流程编辑委员会范围与政策同行评审常见问题投稿
图书馆员
用户评价订阅访问资源图书馆顾问委员会常见问题
研究
JoVE JournalMethods CollectionsJoVE Encyclopedia of Experiments存档
教育
JoVE CoreJoVE BusinessJoVE Science EducationJoVE Lab Manual教师资源中心教师网站
使用条款与条件
隐私政策
政策

相关实验视频

Updated: Jul 12, 2025

Electric-field Control of Electronic States in WS2 Nanodevices by Electrolyte Gating
10:36

Electric-field Control of Electronic States in WS2 Nanodevices by Electrolyte Gating

Published on: April 12, 2018

11.5K

基于范德瓦尔斯二维材料的负电容场效应晶体管.

Ruo-Si Chen1, Yuerui Lu1

  • 1School of Engineering, College of Engineering, Computing & Cybernetics, Australian National University, Canberra, ACT, 2602, Australia.

Small (Weinheim an der Bergstrasse, Germany)
|October 29, 2023
PubMed
概括

铁电负电容 (NC) 场效应晶体管 (FET) 克服了博尔兹曼暴政,以获得更的下值波动 (SS). 2D材料增强NC FET性能和小型化,用于低功耗电子产品.

科学领域:

  • 材料科学 材料科学 材料科学
  • 电气工程 电气工程
  • 凝聚物质物理学 凝聚物质物理学

背景情况:

  • 传统的场效应晶体管 (FET) 由于博尔茨曼暴政而面临限制,限制子值波动 (SS) 在60mV/十年以下.
  • 的SS对于电子设备的低功耗至关重要.
  • 铁电材料通过负电容 (NC) 提供解决方案来放大门电压.

研究的目的:

  • 审查负电容 (NC) FETs 的基本概念.
  • 总结一下2DNC FETs最近的进展情况.
  • 分析影响二维NCFET性能的因素.

主要方法:

  • 对NC FET和2D铁电材料的现有文献的审查.
  • 关键概念的分析:NC,内部门电压,SS,负排水诱导的屏障降低,负差电阻和域状态.
  • 编制和呈现高性能2DNC FET的电气特性.

主要成果:

  • 铁电门堆中的负电容 (NC) 通过放大门电压来有效地降低SS.
  • 二维铁电材料可以提高NC FET的性能和小型化.
  • 确定了影响二维NCFET性能的关键因素.
关键词:
2D NC FETs 是一个 2D NC FET.二维铁电材料是二维的铁电材料.铁电门堆铁电门堆负电容 负电容是指负电容.低于门值的波动可以改变.

更多相关视频

A Standard and Reliable Method to Fabricate Two-Dimensional Nanoelectronics
07:12

A Standard and Reliable Method to Fabricate Two-Dimensional Nanoelectronics

Published on: August 28, 2018

9.7K
Ohmic Contact Fabrication Using a Focused-ion Beam Technique and Electrical Characterization for Layer Semiconductor Nanostructures
08:12

Ohmic Contact Fabrication Using a Focused-ion Beam Technique and Electrical Characterization for Layer Semiconductor Nanostructures

Published on: December 5, 2015

12.4K

相关实验视频

Last Updated: Jul 12, 2025

Electric-field Control of Electronic States in WS2 Nanodevices by Electrolyte Gating
10:36

Electric-field Control of Electronic States in WS2 Nanodevices by Electrolyte Gating

Published on: April 12, 2018

11.5K
A Standard and Reliable Method to Fabricate Two-Dimensional Nanoelectronics
07:12

A Standard and Reliable Method to Fabricate Two-Dimensional Nanoelectronics

Published on: August 28, 2018

9.7K
Ohmic Contact Fabrication Using a Focused-ion Beam Technique and Electrical Characterization for Layer Semiconductor Nanostructures
08:12

Ohmic Contact Fabrication Using a Focused-ion Beam Technique and Electrical Characterization for Layer Semiconductor Nanostructures

Published on: December 5, 2015

12.4K

结论:

  • 2DNC FET代表了实现超低功耗设备的有希望的技术.
  • 对二维NC FET的进一步研究可能会导致半导体技术的重大突破.
  • 该审查提供了一个全面的概述和对2DNC FETs未来的前景.