在碳纳米管晶体管中进行带对带道泄漏电流的表征和投影
Qing Lin1, Carlo Gilardi1, Sheng-Kai Su2
1Dept. of Electrical Engineering, Stanford University, Stanford, California 94305, United States.
ACS nano
|November 1, 2023
概括
这项研究分析了碳纳米管 (CNT) 晶体管的脱状态泄漏,这对于提高设备性能至关重要. 结果指导了在CNT金属氧化物半导体场效应晶体管 (MOSFET) 中减少泄漏电流的最佳设计选择.
科学领域:
- 半导体物理 半导体物理
- 材料科学是一种材料科学.
- 纳米电子学纳米电子学
背景情况:
- 碳纳米管 (CNT) 晶体管具有很高的流动性,但会出现异常泄漏.
- 这种泄漏主要是由于CNT的有效质量和频段差距较小.
- 了解和减轻状态外泄漏对于推进基于CNT的电子产品至关重要.
研究的目的:
- 为了研究静电杂的CNT金属氧化物半导体场效应晶体管 (MOSFETs) 中偏电流 (I_MIN) 的下限.
- 为长通道CNT MOSFET设计空间建模和设计泄漏电流.
- 确定最优的设计参数,以尽量减少离流,同时保持电流.
主要方法:
- 在不同的CNT频段间隙,供应电压和兴奋剂水平上对I_MIN进行实验测量.
- 使用一个不平衡的格林函数 (NEGF) 模型来模拟和验证I_MIN依赖关系.
- 基于经过验证的NEGF模型,设计一个泄漏电流设计空间.
主要成果:
- 证实I_MIN取决于CNT频段间隙,供应电压和扩展兴奋剂水平.
- 在CNT MOSFET中设计了一个用于泄漏电流的设计空间.
- 鉴于当前预测,确定了针对目标非电流密度的最佳设计选择.
结论:
- 该研究为设计具有减少州外泄漏的CNT MOSFET提供了一个框架.
- 扩展兴奋剂水平大于0.5载体/纳米对于优化电流是必要的.
- 这项研究有助于选择适当的设备设计参数,以提高CNT晶体管的性能.
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