通过室温空位工程接近印刷P型CuI晶体管的性能理论极限
Yonghyun Albert Kwon1, Jin Hyeon Kim2, Sunil V Barma2
1Department of Chemical and Biomolecular Engineering, Yonsei University, Seoul, 03722, Republic of Korea.
Advanced materials (Deerfield Beach, Fla.)
|November 3, 2023
概括
新型无机p型薄膜晶体管使用铜一化物 (CuI) 实现高孔流动性. 室温空位工程策略显著提高了透明电子产品的性能.
科学领域:
- 材料科学 材料科学 材料科学
- 固态物理 固态物理
- 设备工程 设备工程
背景情况:
- 开发高性能无机p型薄膜晶体管对于透明电子产品至关重要.
- 一氧化铜 (CuI) 具有可见光透明度和高内在孔流动性,适合低温加工.
- 现有的CuI晶体管表现有限,原因是空缺的电荷和缺陷散射.
研究的目的:
- 开发一种溶液处理的CuI薄膜晶体管,显著提高了孔的移动性.
- 研究一种新的空位工程处理策略对CuI晶体管性能的影响.
- 确认 CuI 增强型晶体管在互补逻辑电路中的适用性.
主要方法:
- 在嵌入的高k介电材料上采用了室温空置工程加工策略.
- 进行了全面的化学,结构,光学和电气分析.
- 制造和测试了---氧化物 (IGZO) -CuI互补逻辑门.
主要成果:
- 处理策略有效调整了CuI的空缺职位,影响了收费运输机制.
- 优化的CuI薄膜晶体管实现了21.6±4.5cm2V-1s-1.1的高孔流动性.
- IGZO-CuI互补逻辑门的成功运行证明了设备的适用性.
结论:
- 室温空位工程是一种可行的策略,可以提高CuI薄膜晶体管的性能.
- 开发的CuI晶体管显示出下一代透明电子设备的前景.
- 这项研究阐明了缺陷和声子散射机制以及晶体域中的电荷移位.
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