在二次离子质谱图像中比较片人工物去除方法
Sevvandi Kandanaarachchi1, Wil Gardner2, David L J Alexander1
1CSIRO's Data61, Research Way, Clayton, Victoria 3168, Australia.
Analytical chemistry
|November 14, 2023
概括
飞行时间二次离子质谱 (ToF-SIMS) 成像中的制文物具有挑战性. 这项研究评估了六种计算方法,发现没有一种单一的普遍有效的方法来删除这些文物,性能取决于特定的数据集.
科学领域:
- 表面分析 表面分析
- 质谱测量质量谱测量
- 材料科学是一种材料科学.
背景情况:
- 飞行时间二次离子质谱 (ToF-SIMS) 能够进行高分辨率的表面表征.
- 大面积的ToF-SIMS分析涉及获取相邻的,可以引入工件.
- 这些工件,包括强度梯度和间变化,使数据解释复杂化.
研究的目的:
- 研究和比较六种计算方法在ToF-SIMS成像中去除形工件的有效性.
- 评估这些方法在不同的超谱ToF-SIMS和OrbiTrapSIMS数据集中的稳定性.
- 根据数据集特征,提供关于删除文物的建议.
主要方法:
- 评价了六种计算片人工物去除技术:张量分解,乘数线性校正,线性差异分析,无拼接,简单的平均和简单的插值.
- 将这些方法应用于三个超谱ToF-SIMS数据集和一个OrbiTrapSIMS数据集.
- 删除文物质量的定量和主观评估,包括统计分析.
主要成果:
- 在所有测试的数据集中,没有一种单一的文物移除方法被证明是普遍有效的.
- 多倍线性校正和无拼接经常获得更高的主观分数,但可能引入新的工件.
- 简单的平均和插值方法在生物数据上表现不佳,但在微阵列数据上表现更好.
结论:
- 移除ToF-SIMS工件的最佳方法取决于数据集.
- 在选择人工物删除策略时,仔细考虑数据特征至关重要.
- 需要进行进一步的研究和开发,以应对在大面积的ToF-SIMS成像中对工件的持续挑战.
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