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来自不同世代半导体制造工厂的无机酸排放的特点
Ming-Peng Yeh1, Lian-Fang Wu2, En-Tsu Fan2
1Environmental Lab., Taiwan Semiconductor Manufacturing Company, Ltd., Taichung, 407, Taiwan.
Chemosphere
|November 19, 2023
概括
半导体制造业的排放量下降,由于技术进步,无机酸减少了38%. 进一步的改进导致15-56%的减少,促进绿色制造.
科学领域:
- 环境科学 环境科学
- 化学工程是化学工程的重要组成部分.
- 材料科学 材料科学 材料科学
背景情况:
- 半导体制造技术的进步改变了气体排放成分.
- 了解不同技术节点的无机酸排放对于环境管理至关重要.
研究的目的:
- 用各种工艺技术分析来自半导体工厂的无机酸排放.
- 评估改善策略在减少这些排放方面的有效性.
主要方法:
- 在九个半导体工厂对酸性,性和有机性废气系统进行堆检查.
- 分析不同技术节点 (3微米至12纳米) 的排放特征.
主要成果:
- 随着技术和污染控制的进步,每片无机酸排放量减少了38%.
- 酸和酸是传统植物的主要污染物;硫酸 (H2SO4) 是先进植物的主要污染物.
- 在改进后,排放量在几代人间下降了15-56%.
结论:
- 技术进步和有针对性的战略显著减少了半导体行业的无机酸排放.
- 通过先进的半导体工艺观察到的初级酸性污染物 (HF/HNO3到H2SO4) 的转变.
- 倡议成功地促进了更绿色的制造实践,并减少了空气污染.
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