沟MIS场板结构的设计,用于GaN垂直PN二极管的边缘终结
1School of Electronic and Electrical Engineering, Hongik University, 94 Wausan-ro, Mapo-gu, Seoul 04066, Republic of Korea.
Micromachines
|November 25, 2023
概括
本研究提出了一个分析模型,用于设计沟金属绝缘体半导体 (MIS) 场板结构在GaN二极管. 该模型简化了边缘终端设计,在没有复杂的模拟的情况下实现了理想的故障电压.
科学领域:
- 材料科学 材料科学 材料科学
- 电气工程 电气工程
- 半导体物理 半导体物理
背景情况:
- 边缘终端对于高压半导体设备至关重要.
- 沟金属绝缘体半导体 (MIS) 场板 (FP) 结构对于边缘终结是有效的.
- 化 (GaN) 设备提供了卓越的性能,但需要强大的边缘设计.
研究的目的:
- 为设计沟MISFP结构开发一个简化的分析模型.
- 为了优化沟MISFP的关键参数,用于垂直的GaNPN二极管.
- 提供一个设计指南,以便在不进行广泛的模拟的情况下有效地终止边缘.
主要方法:
- 开发一个分析模型,考虑沟深度,MIS介电特性和接口电荷.
- 根据最大电场强度定义边界条件.
- 使用技术计算机辅助设计 (TCAD) 模拟模型的验证.
主要成果:
- 一个优化的沟MIS FP结构被设计为1kV的GaN垂直PN二极管.
- 设计的二极管实现了与理想的1D结构可比的断裂电压特性.
- 分析模型成功预测了设备性能,减轻了边缘效应.
结论:
- 拟议的分析模型为沟MISFP边缘终结提供了一个高效的设计准则.
- 这种方法大大减少了需要耗时的TCAD模拟的需求.
- 该模型有助于开发可靠的高压GaN PN二极管.
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