一种基于圆参数补偿的新型伪解方法,用于基于圆参数补偿的双自由度压电驱动合规机制
Rongqi Wang1, Xiaoqin Zhou1, Haonan Meng1
1Key Laboratory of CNC Equipment Reliability, School of Mechanical and Aerospace Engineering, Jilin University, Ministry of Education, Changchun 130022, China.
Micromachines
|November 25, 2023
概括
新的伪脱方法提高了压电驱动的符合规则的机制的圆轨迹跟踪精度. 相差补偿和圆参数补偿提高了微型制造应用中的精度.
科学领域:
- 精密工程 精密工程是指精密的工程.
- 机械工程 机械工程
- 材料科学 材料科学 材料科学
背景情况:
- 两度自由度的压电驱动合规机制 (2-DOF PDCMs) 对于微结构表面的圆振动加工 (EVM) 至关重要.
- 在光学工程和精密制造中,高精度的轨迹跟踪对于在难以切割的材料上制造功能性表面至关重要.
研究的目的:
- 提出和研究新的伪脱方法,以提高2-DOF PDCM的圆轨迹跟踪精度.
- 优化基于相差补偿 (PDC) 和圆参数补偿 (EPC) 的方法的参数.
- 通过实验验证基于EPC的方法的性能.
主要方法:
- 有限元分析 (FEA) 调查PDC角度对跟踪精度的影响.
- 基于EPC的方法使用放大和合系数进行数学建模.
- 使用2-DOF PDCM测量位移和计算系数的实验验证.
主要成果:
- 对于不同的圆参数,FEA模拟确定了最佳的PDC角度.
- 基于EPC的模型成功计算了放大和合系数.
- 实验结果与理论预测有很好的一致性,并分析了计算错误距离.
结论:
- 拟议的PDC和EPC方法为2-DOF PDCM提供了对圆轨迹跟踪精度的显著改进.
- 基于EPC的方法证明了实际应用的实际可行性和准确性.
- 这项研究有助于推进微结构表面的精密制造技术.
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