温度和冲击角度对6H-SiC辐射级联效应的影响:分子动力学模拟

Yaolin Chen1, Hongxia Liu1, Cong Yan1

  • 1Key Laboratory for Wide Band Gap Semiconductor Materials and Devices of Education, School of Microelectronics, Xidian University, Xi'an 710071, China.

Micromachines
|November 25, 2023
PubMed
概括

这项研究揭示了温度和入射角如何影响碳化 (SiC) 设备中的辐射损伤. 较高的温度增加了弗伦克尔对缺陷,而45°的冲击角度将SiC半导体的总缺陷降到最低.