氧化薄膜的特性,由四化和臭氧的原子层沉积而成
Kristjan Kalam1, Peeter Ritslaid1, Tanel Käämbre1
1Institute of Physics, University of Tartu, W. Ostwaldi 1, 50411 Tartu, Estonia.
Beilstein journal of nanotechnology
|November 29, 2023
概括
原子层沉积 (ALD) 成功地使用SnI4和O3.3产生了二氧化 (SnO2) 薄膜. 培养在300°C以上的膜显示单相氧化物形成,杂质最小.
科学领域:
- 材料科学 材料科学 材料科学
- 薄膜沉积的情况
- 半导体技术 半导体技术
背景情况:
- 二氧化 (SnO2) 是一种重要的n型半导体,具有多种应用.
- 原子层沉积 (ALD) 可以精确控制薄膜生长.
- 开发对SnO2的高效ALD过程对于先进的材料应用至关重要.
研究的目的:
- 为了研究多晶SnO2薄膜的原子层沉积 (ALD).
- 为了确定最佳的前体蒸发温度和生长参数.
- 描述沉积的SnO2膜的结构和化学特性.
主要方法:
- 薄膜是在SiO2/Si(100) 基板上使用ALD生长的.
- 使用的前体是四氧化 (SnI4) 和臭氧 (O3).
- 进行了光谱分析,以评估片的组成和质量.
主要成果:
- 确定了SnI4的最佳蒸发温度.
- 每个周期的生长与基质温度 (225-600°C) 相相关.
- 在300°C以上培养的薄膜呈现出单相SnO2与低残留.
结论:
- SnI4/O3前体系统适用于SnO2薄膜的ALD.
- 通过ALD,可以控制高质量的SnO2膜的生长.
- 优化ALD参数可以产生纯净的晶体SnO2膜.
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