Al1/2Ga1/2N

Jessiel Siaron Gueriba1, Hiroshi Mizuseki2, Marilou Cadatal-Raduban1,3

  • 1Institute of Laser Engineering, Osaka University, 2-6 Yamadaoka, Suita, Osaka 565-0871, Japan.

概括

对于电子学至关重要的转移稳定的AlGaN合金,使用大细胞第一原理计算来解释. 该研究确定了一个特定的有序配置 (C42) 负责这种转移稳定性.

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