聚胺薄膜作为核轨道探测器的应用 (2):使用里埃变换红外光谱学研究潜在轨道结构
Tamon Kusumoto1, Yutaka Mori2, Satoshi Kodaira1
1National Institutes for Quantum Science and Technology, 4-9-1 Anagawa, Inage-ku, 263-8555, Chiba, Japan.
概括
较重的离子会产生较小的损伤区域 (轨道半径) 比较轻的离子在类似的能量损失. 这影响了UPILEX-S®和Kapton等聚合物的蚀刻坑形成值.
科学领域:
- 材料科学 材料科学 材料科学
- 核物理 核物理 核物理
- 聚合物科学 聚合物科学
背景情况:
- 了解潜轨结构对于辐射检测至关重要.
- 像UPILEX-S®和Kapton这样的聚胺薄膜用于辐射探测器.
- 蚀刻坑的形成是检测带电粒子轨迹的关键机制.
研究的目的:
- 调查潜轨结构和蚀刻坑形成值之间的关系.
- 为了比较UPILEX-S®和Kapton中的不同离子的行为.
- 阐明辐射剂量分布在轨道形成中的作用.
主要方法:
- 在UPILEX-S®和Kapton中分析潜轨结构.
- 测量G值 (基的产量) 作为能量沉积的函数.
- 使用Ar离子确定蚀刻坑形成的检测值.
主要成果:
- 较重的离子表现出较低的有效轨道核心半径和G值,而不是较轻的离子在类似的停止功率.
- 卡普顿的G值上升幅度在600keV/μm以上,UPILEX-S®的1000keV/μm以上更为.
- 对于离子,UPILEX-S®的检测值为4000 keV/μm,需要损坏多个分子单元.
结论:
- 辐射剂量分布的差异解释了低速和高速离子轨道结构的变化.
- 检测值与受损轨道核心的尺寸相对于聚合物分子结构有关.
- 由于其分子结构和轨道形成特征,UPILEX-S®的检测值高于Kapton.
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