T Johny Dathees1, S Prince Makarios Paul2, Anandhavelu Sanmugam3

  • 1Fluorensic Materials Laboratory, Department of Physical Sciences, Karunya Institute of Technology and Sciences (Deemed-to-be University), Karunya Nagar, Coimbatore 641 114, India.

概括

一种新的希夫基 (HNPD) 作为一种高度敏感的化化学传感器,用于检测离子 (Al3+). 该传感器表现出极好的选择性,并成功地应用于真实环境样本.