在室内和高温下化epi-film的光学和结构性质
Yanlian Yang1, Yao Liu1, Lianshan Wang1,2
1Research Center for Optoelectronics Materials and Devices, Guangxi Key Laboratory for the Relativistic Astrophysics, School of Physical Science and Technology, Guangxi University, Nanning 530004, China.
Materials (Basel, Switzerland)
|December 9, 2023
概括
较厚的化 (AlN) 涂层提高了晶体质量,并减少了深紫外线 (DUV) 设备中的失位. 增加厚度可以提高带隙能量的热稳定性.
科学领域:
- 材料科学 材料科学 材料科学
- 固态物理 固态物理
- 光电学是指光电子产品.
背景情况:
- 高质量的化 (AlN) 涂层对于半导体深紫外线 (DUV) 光电子设备至关重要.
- 控制薄膜厚度对于优化AlN层性能至关重要.
研究的目的:
- 研究AlN上层厚度对其结构和光学性能的影响.
- 了解薄膜厚度如何影响脱位密度和带隙特征.
主要方法:
- 在c平面蓝宝石基板上生长出不同厚度的AlN上层.
- 使用高分辨率X射线衍射 (HR-XRD),扫描电子显微镜 (SEM),UV-Vis光谱摄影和光谱圆测量 (SE) 的表征.
主要成果:
- 较厚的AlN薄膜表现出较低的脱位密度,作为应变缓解层.
- 光学带隙和乌尔巴赫的能量受到晶体的尺寸,对齐和厚度的影响.
- 光谱圆测量提供了比光学传输更准确的带隙值.
- 增加薄膜厚度可以提高带隙能量的热稳定性.
结论:
- 优化AlN薄膜厚度是一种可行的策略,可以提高晶体质量和设备性能.
- 较厚的AlN外皮层为光电子应用提供了更好的热稳定性.
- 该研究证实了结构性质和光学特征之间的相关性,作为厚度的函数.
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