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Updated: Jul 8, 2025

Rapid Repetition Rate Fluctuation Measurement of Soliton Crystals in a Microresonator

Rapid Repetition Rate Fluctuation Measurement of Soliton Crystals in a Microresonator

Published on: December 15, 2021

在薄型多模化微复原器中对深色单体进行几何优化.

Yaojing Zhang, Shuangyou Zhang, Toby Bi

|December 13, 2023

概括

研究人员开发了用于频率的薄化 (Si3N4) 光子装置. 这种方法克服了较厚的薄膜中的压力问题,使得用于电信和光谱的紧,低噪音的暗脉冲产生成为可能.

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使用条款与条件

科学领域:

综合光子学综合光子学
材料科学是一种材料科学.
非线性光学是一种非线性光学.

背景情况:

化 (Si3N4) 对于超低损耗集成光学和频率生成至关重要.
需要厚厚的Si3N4膜 (>600nm) 来产生明亮的单离子,但会受到应力和裂纹.
薄Si3N4薄膜 (<400nm) 提供了诸如一步沉积的优势,但需要针对非线性进行优化设计.

研究的目的:

设计一个集成的Si3N4结构,以实现最佳的有效非线性和紧的足迹.
为了研究波导厚度,非线性和设备稳定性之间的权衡.
为了证明使用薄Si3N4薄膜用于先进的光子应用的可行性.

主要方法:

对具有不同波导厚度的Si3N4共振器进行比较分析.
在多模式Si3N4共振器中进行暗脉冲生成的实验演示.
响应器足迹,质量因子和生成的暗属性的表征.

主要成果:

400纳米薄的Si3N4薄膜提供了有效的非线性和设备稳定性之间的平衡.
产生了低噪音连贯的暗脉冲,其重复率为25 GHz.
一个紧的螺旋共振器 (0.28mm2) 与一个高质量的因素 (4×106) 被制造出来.

结论:

薄 (400纳米) 化薄膜是集成光子学的一个可行的替代方案,避免了压力问题.
展示的暗具有显著的潜力,用于微波光子学,光谱学和电信.
优化的薄膜Si3N4共振器为产生高性能频率提供了一个有前途的平台.

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