线,

Yuka Esashi1, Nicholas W Jenkins1, Yunzhe Shao1

  • 1Department of Physics, JILA, and STROBE NSF Science and Technology Center, University of Colorado Boulder and NIST, Boulder, Colorado 80309, USA.

PubMed
概括

一种新的极紫外 (EUV) 成像反射仪为纳米结构提供了高精度,非破坏性的计量技术. 这种先进的工具量化测量了几何和组成,这对于半导体和材料科学应用至关重要.