使

Arthur F Lipinski1, Christopher W Lambert1, Achyut Maity1

  • 1School of Mathematics and Physics, Queen's University Belfast, Belfast BT7 1NN, U.K.

ACS applied electronic materials
|January 1, 2024
PubMed
概括

化 (TiN) 薄膜为等离子体提供了一个有希望的替代品. 一个CrRu缓冲层使高质量的TiN能够在经济高效的基板上实现,实现出色的等离子体性能.

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