超短垂直通道MoS2晶体管使用自行调整的接触式晶体管
Liting Liu1, Yang Chen1, Long Chen1
1Key Laboratory for Micro-Nano Optoelectronic Devices of Ministry of Education, School of Physics and Electronics, Hunan University, Changsha, 410082, China.
Nature communications
|January 3, 2024
概括
研究人员开发了一种超大规模二维 (2D) 晶体管的自我调整过程. 这种方法使二硫化物 (MoS2) 晶体管中门和通道长度的同时缩放,实现亚纳米门长度,并显著提高性能.
科学领域:
- 材料科学 材料科学 材料科学
- 纳米技术纳米技术
- 半导体物理 半导体物理
背景情况:
- 二维 (2D) 半导体为超级晶体管提供了潜力.
- 在短门晶体管中,同时减少门和通道长度存在扩展挑战,通常是由于接触失调造成的.
- 二硫化物 (MoS2) 晶体管已经证明了短门长度,但通道长度的缩放仍然很困难.
研究的目的:
- 开发一种自我调整工艺,用于制造超级规模的2D晶体管.
- 为了克服与门电极对齐源-排水接触的处理困难.
- 在MoS2晶体管中实现门和通道长度同时缩放.
主要方法:
- 石墨烯/BN/MoS2异构结构的机械折叠.
- 使用异构结构厚度来定义通道长度.
- 在折叠的边缘周围精确对准源-排水金属.
主要成果:
- 在垂直MoS2晶体管中同时实现sub-1nm门长和sub-50nm通道长.
- 实现了超过10^5.5的开关比率.
- 在4V偏向下展示了250μA/μm的现状电流,比非自我调整的设备改进了40倍.
结论:
- 开发的自我调整过程对于制造超级规模的2D晶体管是有效的.
- 这种技术使得门和通道长度同时进行缩放,这对于下一代电子产品至关重要.
- 自调 MoS2 晶体管表现出显著增强的性能指标.
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