短波红外光发光的生命周期绘制的稀土杂纳米颗粒使用全光线条图像使用全光线条图像
Miao Liu1, Yingming Lai1, Miguel Marquez1
1Centre Énergie Matériaux Télécommunications, Institut National de la Recherche Scientifique, Université du Québec, 1650 boulevard Lionel-Boulet, Varennes, Québec, J3X1P7, Canada.
Advanced science (Weinheim, Baden-Wurttemberg, Germany)
|January 6, 2024
概括
一个全新的全光条纹摄像系统大大提高了短波红外光发射寿命成像速度和对稀土杂纳米颗粒的灵敏度,从而实现了先进的材料分析.
科学领域:
- 光学和光子学 在光学和光子学.
- 材料科学 材料科学 材料科学
- 纳米技术纳米技术
背景情况:
- 稀土杂纳米粒子 (RENPs) 的短波红外 (SWIR) 光发光寿命对于各种应用至关重要.
- 现有的SWIR光发光度终身成像系统存在低光子检测效率,缓慢的成像速度和敏感性差的问题.
研究的目的:
- 开发一个先进的SWIR光发光终身成像显微镜系统,以克服目前的局限性.
- 为了提高成像速度,灵敏度和用于RENP分析的光子检测.
主要方法:
- 使用全光条纹摄像机 (SWIR-PLIMASC) 开发SWIR光发光终身成像显微镜.
- 将扫描光学与高灵敏度的InGaAs CMOS摄像头集成在一起,用于快速的1D成像.
- 通过1D样本扫描获取二维光发射寿命图.
主要成果:
- 在900-1700 nm的光谱范围内,SWIR-PLIMASC实现了高达138.9 kHz的1D成像速度.
- 该系统允许对RENPs进行一次性光发光度寿命量化.
- 已证明的应用包括使用Er3+兴奋剂RENPs的多重防伪和使用Ho3+兴奋剂RENPs的SWIR光发光寿命基温度计.
结论:
- 开发的SWIR-PLIMASC系统为高效的SWIR光发光寿命映射提供了重大进步.
- 这项技术有望用于先进材料表征,信息科学和生物医学方面的应用.
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