对n通道的接口陷效应GaN Schottky屏障-金属氧化物半导体场效应晶体管用于紫外线光电子集成
Byeong-Jun Park1, Han-Sol Kim1, Sung-Ho Hahm1
1School of Electronic and Electrical Engineering, Kyungpook National University, Daegu 41566, Republic of Korea.
Nanomaterials (Basel, Switzerland)
|January 11, 2024
概括
这项研究分析了化 (GaN) Schottky屏障金属氧化物半导体场效应晶体管 (SB-MOSFETs) 对于紫外线 (UV) 光探测器的陷状态. 陷状态显著影响设备性能,影响电流密度和电压变化.
科学领域:
- 半导体设备物理学 半导体设备物理
- 光电学是指光电子产品.
- 材料科学 是一种材料科学.
背景情况:
- 紫外线 (UV) 光探测器对于各种工业,军事和科学应用至关重要.
- 斯科特基屏障 (SB) -MOSFETs由于其低暗电流和高屏障特性,对光电子具有前景.
研究的目的:
- 研究陷状态对n通道GaN SB-MOSFET性能的影响.
- 了解这些设备中紫外线检测背后的机制.
主要方法:
- 技术计算机辅助设计 (TCAD) 模拟被用来建模GaN SB-MOSFET.
- 分析的重点是不同类型的陷状态 (浅/深,捐赠者/接受者) 在各种接口的影响.
主要成果:
- 浅的捐赠者状陷降低了下值波动和异常电流.
- 浅接收器类型的陷会对值电压,次值波动和启动状态电流产生负面影响.
- 由于浅水中被困的洞所引起的光门效应增强了紫外线的响应.
结论:
- 氧化物/GaN和金属/GaN接口上的陷状态极大地影响了GaN SB-MOSFET的输出特性.
- 了解陷行为对于优化紫外线光探测器性能和单体集成至关重要.
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