在10nm以下的DG ML四-GeC2 n型MOSFET中全面了解电子流动性和优异性能
Yuehua Xu1, Daqing Li1, He Sun1
1School of Microelectronics and Control Engineering, Changzhou University, Changzhou 213164, Jiangsu, China. yhxu@cczu.edu.cn.
Physical chemistry chemical physics : PCCP
|January 17, 2024
概括
单层四-GeC2具有很高的电子流动性,超过了MoS2.2. 这种二维材料在10nm以下的晶体管中表现出色,满足高性能和低功耗应用的要求.
科学领域:
- 计算材料科学科学 计算材料科学
- 凝聚物质物理学 凝聚物质物理学
- 纳米技术纳米技术
背景情况:
- 研究用于先进半导体设备的新型2D材料对于未来的电子产品至关重要.
- 单层 (ML) 四合体-GeC2 是一个有前途的候选物,但其电子传输特性需要详细研究.
- 了解电子移动性的限制是优化设备性能的关键.
研究的目的:
- 用理论计算来研究ML tetrahex-GeC2的电子流动性.
- 为了评估10nm以下双门 (DG) ML四-GeC2 n型MOSFET的性能.
- 为了比较ML tetrahex-GeC2的性能与已知的2D材料,如MoS2和.
主要方法:
- 通过正常化的全频宽松时间近似 (RTA) 解决线性化的博尔兹曼运输方程 (BTE).
- 使用密度函数理论 (DFT) 进行材料属性计算.
- 在MOSFET性能评估中进行ab initio量子传输模拟.
主要成果:
- 发现ZA声学模式,而不是LA模式,是电子移动的主要限制.
- 在300 K的电子流动性为803 cm^2/(V s),明显高于MoS2.
- 在10nm以下的DG ML四-GeC2n型MOSFET显示出具有竞争力的状态电流 (离子),低下值波动 (SSs) 和降低功率消耗 (PDP) 在高性能 (HP) 和低功率 (LP) 应用中.
结论:
- 与MoS2.2相比,ML tetrahex-GeC2具有更高的电子流动性.
- 10纳米以下的DG ML四-GeC2 n型MOSFET对于未来的高性能和低功耗电子设备是可行的.
- 该材料显示了降级到5-9纳米节点的优秀潜力,在弹道极限内提供了可取的性能指标.
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