铁电Al的泄漏机制和循环行为0.7Sc0.3N
Li Chen1, Qiang Wang2, Chen Liu1
1Institute of Microelectronics, Agency for Science, Technology and Research (A*STAR), Singapore 138634, Singapore.
Materials (Basel, Switzerland)
|January 23, 2024
概括
铁电化 (AlN) 薄膜中的高泄漏电流与空缺有关. 设备循环通过降低陷能量水平进一步增加泄漏,影响可靠性.
科学领域:
- 材料科学 材料科学 材料科学
- 固态物理 固态物理
- 电气工程 电气工程
背景情况:
- 铁电性酸化 (Al$_{1-x}$Sc$_{x}$N) 显示出有前途的铁电性.
- 在Al$_{1-x}$Sc$_{x}$N中,高泄漏电流对设备的扩展和可靠性构成挑战.
研究的目的:
- 调查Al$_{0.7}$Sc$_{0.3}$N片中的泄漏电流的来源.
- 分析双极循环对铁电FeRAM设备中的泄漏电流的影响.
主要方法:
- 对Al$_{0.7}$Sc$_{0.3}$N电影的实验性表征.
- 理论计算以确定泄漏机制.
- 在不同温度下测量直流 (DC) 泄漏.
- 陷辅助的普尔-弗伦克尔 (P-F) 排放的分析.
主要成果:
- 在Al$_{0.7}$Sc$_{0.3}$N的泄漏电流来源于正电荷的空位.
- 泄漏机制与陷辅助的普尔-弗伦克尔排放相一致.
- 在强制场以上的双极循环显著增加了泄漏电流.
- 泄漏率的增加归因于陷能量水平的降低.
结论:
- 空缺是Al$_{0.7}$Sc$_{0.3}$N.N.中泄漏电流的主要来源.
- 设备循环通过改变陷能量水平来降低铁电特性.
- 了解泄漏机制对于可靠的铁电内存应用至关重要.
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