一个2.8kV断裂电压α-Ga2O3 MOSFET与混合的肖特基排水接触
Seung Yoon Oh1, Yeong Je Jeong2, Inho Kang3
1Department of Intelligent Semiconductor, Soongsil University, Seoul 06938, Republic of Korea.
Micromachines
|January 23, 2024
概括
研究人员开发了使用新型混合Schottky排水 (HSD) 接触的α-氧化物 (α-Ga2O3) 功率MOSFET. 这项创新大大降低了电源电阻,并实现了创纪录的故障电压,提高了功率电子设备的性能.
科学领域:
- 材料科学 材料科学 材料科学
- 半导体物理 半导体物理
- 电气工程 电气工程
背景情况:
- 阿尔法氧化物 (α-Ga2O3) 是一个有前途的宽带间隙半导体,用于电源设备,因为它的异质增长能力.
- 优化设备结构,特别是排水接触,对于实现α-Ga2O3在高功率应用中的全部潜力至关重要.
研究的目的:
- 为了证明包含混合的Schottky排水 (HSD) 的α-Ga2O3 MOSFET,联系.
- 为了评估性能改进在电阻和故障电压与传统的欧米排水 (OD) 接触相比.
主要方法:
- 制造具有HSD接触的α-Ga2O3金属氧化物半导体场效应晶体管 (MOSFET).
- 设备电性能的表征,包括启动电阻 (R_on) 和故障电压 (BV).
- 基于物理的技术计算机辅助设计 (TCAD) 模拟来分析设备物理和验证实验结果.
主要成果:
- 与OD设备相比,HSD设备的电阻值为2.1kΩmm,显著降低.
- 对于HSDα-Ga2O3 MOSFETs来说,证明了2.8kV的记录故障电压,超过了OD设备的1.7kV.
- TCAD模拟证实了Schottky地区的启动特性和R_on增强.
结论:
- 混合的Schottky排水接触是提高α-Ga2O3功率MOSFET性能的一种高度有效的策略.
- 该HSD结构为开发下一代α-Ga2O3电源设备提供了一个有前途的途径,具有优越的电阻和故障电压.
- 对HSD设计的进一步优化有可能在α-Ga2O3功率电子中取得更大的进步.
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