高性能MoS2光电晶体管与Hf1-xAlxO后门介电层由等离子增强原子层沉积增长的后门介电层
Qiu-Jun Yu1, Xiao-Xi Li1,2, Yu-Chun Li1
1State Key Laboratory of ASIC and System, Shanghai Institute of Intelligent Electronics & Systems, School of Microelectronics, Fudan University, Shanghai 200433, People's Republic of China.
Nanotechnology
|February 5, 2024
概括
胺氧化通过减少泄漏电流来改善硫化 (MoS) 光传感器. 这种增强导致优越的光电子性能,为先进的光探测器应用铺平了道路.
科学领域:
- 材料科学 材料科学 材料科学
- 纳米技术 纳米技术
- 光电学是指光电子产品.
背景情况:
- 硫化 (MoS) 由于其独特的电子和光学特性,是光传感器的一个有前途的二维材料.
- 现有的MoS2光电晶体管存在诸如高门泄漏电流和接口散射等问题,限制了它们的性能.
- 化氧化 (Hf1-xAlxO) 提供了一个潜在的解决方案,其高介电常数和结晶温度.
研究的目的:
- 开发一种高性能MoS2光电晶体管,使用一种Al-化氧化物介电层.
- 研究Hf1-xAlxO对MoS2光传感器光电子特性的影响.
- 阐明性能提升背后的机制.
主要方法:
- 使用等离子体增强的原子层沉积制造MoS2光电晶体管与Hf1-xAlxO门介电层.
- 描述光电晶体管的光电子性能,包括响应性,检测性,光与暗电流比率和外部量子效率.
- 对能量频段对齐和操作机制的分析.
主要成果:
- 制造的MoS2光电晶体管表现出了卓越的性能指标.
- 实现了高响应度为2.2 × 10 4 A W-1 .
- 获得了1.7 × 10 17 斯的大探测度,照片到黑暗电流比为2.2 × 10 6%,外部量子效率为4.4 × 10 6%.
结论:
- 作为门介电体的Al-doped氧化海的集成显著提高了MoS2光电晶体管的性能.
- 改进的介电性质有效地减轻了诸如门泄漏电流等问题.
- 这项工作为推进各种应用的基于MoS2的光电子设备提供了一个有前途的战略.
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