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针对异常校正电子显微镜的20纳米以下薄膜的坚固制备

Hideyo Tsurusawa¹, Jun Uzuhashi², Yusuke Kozuka³

¹LQUOM Inc., 79-5, Tokiwadai, Hodogaya, Yokohama, 240-8501, Japan.

|February 23, 2024

概括

聚焦离子束/扫描电子显微镜 (FIB/SEM) 现在可以为先进显微镜实现20nm以下的薄膜制备. 实时厚度反可以实现精确的控制,这对于原子级材料分析至关重要.

科学领域:

材料科学材料科学材料科学
电子显微镜电子显微镜
纳米技术纳米技术

背景情况:

偏差校正扫描传输电子显微镜 (STEM) 需要超薄的薄膜 (<20 nm) 进行原子层次的研究.
聚焦离子束/扫描电子显微镜 (FIB/SEM) 是面膜制备的标准,但缺乏纳米级厚度控制.

研究的目的:

开发一种可靠的方法,使用FIB/SEM制备20nm以下的薄片.
为了实现先进显微镜的细片厚度的精确实时控制.

主要方法:

实现实时厚度量化,使用回散电子SEM成像 (0-100nm范围).
利用这种反循环在目标厚度结束FIB/SEM稀释.
证明了1nm级厚度的可控性.

主要成果:

从SrTiO3晶体中成功制备了接近10纳米的薄片.
在目标异质接口实现可控制的稀释,从LaAlO3/SrTiO3.3中制备一个20nm以下的板块.
验证了该方法是稳健的,并且独立于运营商.

结论:

开发的FIB/SEM方法与实时反使得准确的20nm以下的叶片制备.
这种技术适用于各种材料,对于推进异常校正的STEM研究至关重要.
该平台将对材料科学和半导体行业产生重大影响.

关键词:

在FIB/SEM中.在SEM成像中使用SEM成像.经过异常纠正的STEM.拉梅拉制备剂拉梅拉制备剂厚度量化量化的厚度.

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