通过范德瓦尔斯集成增强多层InSe晶体管中载体移动性的载体移动性
Zhiwei Li1,2, Jidong Liu1,2, Haohui Ou1,2
1State Key Laboratory of Radio Frequency Heterogeneous Integration, Shenzhen University, Shenzhen 518060, China.
Nanomaterials (Basel, Switzerland)
|February 23, 2024
概括
范德瓦尔斯集成显著提高了化 (InSe) 场效应晶体管 (FET) 中的电子流动性. 这种方法提高了InSe FET的性能和稳定性,用于先进的电子和光电子.
科学领域:
- 材料科学 材料科学 材料科学
- 凝聚物质物理学 凝聚物质物理学
- 纳米技术纳米技术
背景情况:
- 二维的化 (InSe) 具有有前途的电子和光电子性能.
- 现有的 InSe 晶体管面临着因界面障碍和环境因素造成的外部散射的挑战,限制了载体的移动性和密度.
- 这些局限性阻碍了基于InSe的设备的实际应用.
研究的目的:
- 为了增强多层 InSe 场效应晶体管 (FET) 的电子流动性.
- 调查范德瓦尔斯 (vdW) 集成对提高InSe FET表现的有效性.
- 探索VDW集成的InSe FET中性能提升的稳定性和潜在机制.
主要方法:
- 使用非破坏性范德瓦尔斯 (vdW) 集成技术.
- 使用六角化 (h-BN) 作为封装层和后门介电.
- 嵌入式石墨烯作为缓冲接触层.
主要成果:
- 在InSe FETs的电子流动性方面取得了实质性的改进.
- vdW集成设备显示出高电子流动性超过103 cm2 V-1 s-1和电流开/关比约108在室温下.
- 观察到的电子密度超过10-12厘米-2厘米,并且在环境条件下在一个月内可忽略不计的降解下具有优异的设备稳定性.
结论:
- 范德瓦尔斯集成有效地改善了多层InSe FET中的电子移动性和开/关比.
- 性能提升归因于对接口杂质的有效选和对空气敏感的InSe表面的被动化.
- 这些发现突显了VDW集成在开发高性能和稳定的基于InSe的电子和光电子设备方面的潜力.
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