在国外TDDB降解下对SOI MOSFET氧化物的RC-影响:RF特征和建模
Alan Otero-Carrascal1, Dora Chaparro-Ortiz1, Purushothaman Srinivasan2
1Instituto Nacional de Astrofísica, Óptica y Electrónica (INAOE), Puebla 72840, Mexico.
Micromachines
|February 24, 2024
概括
这项研究通过检查电荷捕获,介电损失和泄漏电流来分析网关氧化物中的射频 (RF) 阻抗. 一种新的方法准确地模拟了这些效应,即使是在设备降解过程中.
科学领域:
- 电气工程 电气工程
- 材料科学 材料科学 材料科学
- 半导体物理 半导体物理
背景情况:
- 网关氧化物中的动态电荷捕获/解锁会影响设备的性能.
- 介电损失和泄漏电流是无线电频率 (RF) 阻抗的关键因素.
- 了解这些影响对于准确的设备建模和可靠性评估至关重要.
研究的目的:
- 分析动态捕获,介电损失和泄漏电流对RF小信号输入阻抗的影响.
- 开发一种方法来提取与这些影响相关的模型参数.
- 研究这些参数在电应力和不同偏差条件下的演变.
主要方法:
- 使用S参数测量进行射频分析.
- 从不同频率的单个设备测量中系统地提取模型参数.
- 将该方法应用于非导电应力和可变的门到源偏差下的设备.
主要成果:
- 通过将额外的电阻和电容组件纳入电容模型,实现高达30 GHz的射频阻抗的准确建模.
- 成功地区分了不同物理效应对设备阻抗的贡献.
- 在状态下下降和在不同的偏差条件下,证明了在状态下下降和在不同的偏差条件下保持相关性准确性.
结论:
- 拟议的方法有效地分析和建模影响半导体器件射频阻抗的动态效应.
- 增强的门电容模型提供了与实验数据的良好相关性.
- 该方法对于在各种操作条件下评估设备退化和性能是可靠的.
相关概念视频
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