通过通过原子层沉积的均层间插入来降低基于MoS2的场效应晶体管的接触电阻
Whang Je Woo1, Seunggi Seo1,2, Hwi Yoon1
1School of Electrical and Electronic Engineering, Yonsei University, 50 Yonsei-Ro, Seodaemun-Gu, Seoul 120-749, Republic of Korea.
The Journal of chemical physics
|March 8, 2024
概括
我们开发了一种新的金属绝缘体半导体 (MIS) 接触器,用于使用原子层沉积 (ALD) 的二硫化物 (MoS2) 晶体管. 这种方法通过提高薄膜均性和实现n型合,显著降低了接触阻力 (RC),为先进的MoS2电子铺平了道路.
科学领域:
- 材料科学 材料科学 材料科学
- 纳米技术纳米技术
- 半导体物理 半导体物理
背景情况:
- 二硫化物 (MoS2) 是一种二维材料,它提供了超越的下一代电子产品的潜力.
- 高接触电阻 (RC) 是基于MoS2的实用电子产品的主要障碍,因传统剂技术对超薄的MoS2不适合而加剧.
- 金属绝缘体半导体 (MIS) 架构是实现低和稳定的RC接触的有希望的方法.
研究的目的:
- 引入一种用于制造MIS接口的新策略,以大幅降低单层MoS2场效应晶体管 (FET) 的RC.
- 研究原子层沉积 (ALD) 参数对Al2O3间层均性的影响及其与RC的相关性.
- 探索异醇 (IPA) 在ALD中作为氧化剂的使用,以增强兴奋剂和进一步降低道阻力.
主要方法:
- 使用ALD为MIS接触器沉积Al2O3中间层制造底门的MoS2FET.
- 优化ALD Al2O3薄膜在MoS2上的均性,通过调节150°C的前体注射压力,遵循兰格穆尔等温原理.
- 在ALD过程中将IPA作为氧化剂纳入MoS2.2,以诱导n型兴奋剂.
主要成果:
- 通过优化前体压力,在MoS2上实现了ALD Al2O3薄膜显著增强的均性,证明了独立于薄膜厚度的RC上具有关键作用.
- 证明使用IPA作为氧化剂有效降低了通过MoS2.2的n型兴奋剂的道阻力.
- 与本研究中制造的其他MoS2FET相比,报告了接触电阻的提高超过两倍,这归因于均的中间层和强烈的兴奋剂的组合.
结论:
- 开发的基于ALD的MIS接触策略大大降低了单层MoS2FET中的RC.
- 薄膜均性和受控的n型兴奋剂是实现MoS2设备中超低接触电阻的关键因素.
- 这种方法为实现基于MoS2的高性能和稳定的电子设备提供了可行的途径.
相关概念视频
MOS Capacitor
779
A Metal-Oxide-Semiconductor (MOS) capacitor is a fundamental structure used extensively in semiconductor device technology, particularly in the fabrication of integrated circuits and MOSFETs (metal-oxide-semiconductor field-effect transistors). The MOS capacitor consists of three layers: a metal gate, a dielectric oxide, and a semiconductor substrate.
The metal gate is typically made from highly conductive materials such as aluminum or polysilicon. Beneath the metal gate lies a thin layer of...
The metal gate is typically made from highly conductive materials such as aluminum or polysilicon. Beneath the metal gate lies a thin layer of...
779
Metal-Semiconductor Junctions
350
The contact of metal and semiconductor can lead to the formation of a junction with either Schottky or Ohmic behavior.
Schottky Barriers
Schottky barriers arise when a metal with a work function (Φm) contacts a semiconductor with a different work function (Φs). Initially, electrons transfer until the Fermi levels of the metal and semiconductor align at equilibrium. For instance, if Φm > Φs, the semiconductor Fermi level is higher than the metal's before contact. The...
Schottky Barriers
Schottky barriers arise when a metal with a work function (Φm) contacts a semiconductor with a different work function (Φs). Initially, electrons transfer until the Fermi levels of the metal and semiconductor align at equilibrium. For instance, if Φm > Φs, the semiconductor Fermi level is higher than the metal's before contact. The...
350
Field Effect Transistor
401
Field-effect transistors (FETs) are integral to electronic circuits and distinguished by their three-terminal setup: the gate, drain, and source. These transistors operate as unipolar devices, which utilize either electrons or holes as charge carriers, in contrast to bipolar transistors, which use both types of carriers. The primary function of the FET is to modulate the flow of these carriers from the source to the drain through a channel. The voltage difference between the gate and source...
401
MOSFET: Enhancement Mode
335
Enhancement-mode MOSFETs are pivotal components in electronics, distinguished by their capacity to act as highly efficient switches. They are part of the larger family of metal-oxide Semiconductor Field-Effect Transistors (MOSFETs). They are available in two types: p-channel and n-channel, each tailored to specific polarity operations.
In their basic form, enhancement-mode MOSFETs are typically non-conductive when the gate-source voltage (Vgs) is zero. This default 'off' state means no...
In their basic form, enhancement-mode MOSFETs are typically non-conductive when the gate-source voltage (Vgs) is zero. This default 'off' state means no...
335
MOSFET
469
The Metal-Oxide-Semiconductor Field-Effect Transistor (MOSFET) plays a pivotal role in modern electronics thanks to its versatility and efficiency in controlling electrical currents. This device, also known as IGFET, MISFET, and MOSFET, has three main terminals: the Source, Drain, and Gate. MOSFETs are classified into n-channel or p-channel types based on the doping characteristics of their substrate and the source or drain regions.
In an n-MOSFET, the structure includes n-type source and drain...
In an n-MOSFET, the structure includes n-type source and drain...
469
MOSFET: Depletion Mode
354
Depletion-mode MOSFETs represent a unique subset of MOSFET technology, functioning fundamentally differently from their enhancement-mode counterparts. Unlike enhancement MOSFETs, which require a positive gate-source voltage (Vgs) to turn on, depletion-mode MOSFETs are inherently conductive and "normally on" devices.
The primary characteristic of depletion-mode MOSFETs is their ability to conduct current between the drain and source terminals without gate bias. This inherent conductivity...
The primary characteristic of depletion-mode MOSFETs is their ability to conduct current between the drain and source terminals without gate bias. This inherent conductivity...
354


