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Updated: May 7, 2026

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对于非线性光子的升级和雪崩纳米颗粒的联体辅助直接光刻

Jia-Ahn Pan^1,2, Artiom Skripka^1,3, Changhwan Lee⁴

¹Molecular Foundry, Lawrence Berkeley National Laboratory, Berkeley, California 94720, United States.

Journal of the American Chemical Society

|March 11, 2024

概括

研究人员开发了新的方法,使用尺寸依赖的配体化学方法创建高分辨率的升级纳米粒子 (UCNP). 这可以通过精确控制纳米粒子排列来实现先进的光学设备.

科学领域:

材料科学
纳米技术
光学学

背景情况:

上转换纳米粒子 (UCNP) 具有独特的非线性光学特性,对显微镜,传感和光子学有价值.
制造高分辨率的UCNP图案具有高包装密度仍然是一个重大挑战.
了解纳米粒子大小如何影响图案化学对于优化制造至关重要.

研究的目的:

调查各种UCNP组合 (Tm3+,Yb3+/Tm3+,Yb3+/Er3+) 和大小 (6-18 nm) 的直接模式化学.
探索纳米粒子大小对基于联体的离子和共价键策略的UCNP模式的影响.
开发使用紫外线,电子束和NIR曝光的UCNP局部化高分辨率模式方法.

主要方法:

在UV,e-beam和NIR曝光下利用连接或UCNP之间的共价键.
研究了UCNP大小 (6-18 nm) 对配体选择和模式结果的影响.
开发了一种局部交叉链接方法,用于薄膜UCNP,与散装单体方法形成对比.

主要成果:

通过使用紧的离子配体成功定型了6纳米UCNP.
确定较大的UCNP需要长链,可交叉链接的配体,以防止薄膜造过程中的聚合.
通过密集的UCNP实现了高分辨率的图案 (UV/NIR≤1μm,e-beam≤100nm).
使用连续波激光器进行2D和3D图案的升级NIR光刻.

结论:

UCNP的大小极大地影响了对有效模式的配体化学的选择.
局部的光/电子启动化学可以准确,高分辨率的UCNP图案制造.
开发的NIR光谱为先进的体材料图案提供了成本效益的途径,保留了光学设备的UCNP功能.

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