通过改变插入的AlGaN电子阻断层的Al含量来控制基于GaN的激光二极管的性能
Yuhui Chen1, Daiyi Jiang2, Chunmiao Zeng2
1Department of Applied Physics, China Agricultural University, Beijing 100083, China.
Nanomaterials (Basel, Switzerland)
|March 12, 2024
概括
优化激光二极管 (LD) 性能需要仔细选择电子阻断层 (EBL). 对于紫色LDs,EBL中的Al含量为0.25是最佳的,而绿色LDs受益于最小的Al含量.
科学领域:
- 光电学是指光电子产品.
- 材料科学 材料科学 材料科学
- 半导体物理 半导体物理
背景情况:
- 激光二极管 (LD) 中的电子电流泄漏显著影响设备性能.
- 电子阻断层 (EBL) 在减轻泄漏和优化LD特征方面发挥着至关重要的作用.
研究的目的:
- 以数值评估具有不同波长和EBL中的Al含量的LD的性能.
- 从理论上研究EBL对LD性能的影响机制.
- 为了确定不同发射波长的EBL中最佳的Al含量.
主要方法:
- 使用商业模拟软件 (LASTIP) 进行数值评估.
- 研究了多层LD结构,包括覆盖层,波导,量子井,接触层和AlxGa1-xN EBL层.
- 分析模拟的电气和光学特性,以了解EBL的影响.
主要成果:
- 对于短波长紫色LD,在EBL中Al含量 (x) 约为0.25时,可以实现最佳的电和光特性.
- 对于长波长绿色LD,在EBL中尽可能低的Al含量获得最佳性能.
- 随着辐射波长在紫色到绿色光谱中增加,EBL Al含量对LD性能的影响会加剧.
结论:
- 在EBL中最佳的Al含量取决于波长,对于最大限度地提高LD效率至关重要.
- 紫色和绿色的LD性能可以通过调整EBL组成来微调.
- 这项研究为设计高性能可见光谱LDs提供了宝贵的见解.
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