积极偏差应力不稳定性对值电压的依赖及其起源于溶液处理的注氧化薄膜晶体管中的依赖
Jeong-Hyeon Na1, Jun-Hyeong Park1, Won Park1
1School of Electronic and Electrical Engineering, Kyungpook National University, 80 Daehakro, Bukgu, Daegu 41566, Republic of Korea.
Nanomaterials (Basel, Switzerland)
|March 12, 2024
概括
在氧化薄膜晶体管 (TFT) 中的兴奋剂控制了门电压,减少了在正偏应力 (PBS) 下的不稳定性. 这项研究阐明了缓慢和快速陷在电子设备TFT性能中的作用.
科学领域:
- 材料科学 材料科学 材料科学
- 电气工程 电气工程
- 半导体物理 半导体物理
背景情况:
- 薄膜晶体管 (TFT) 对电子设备至关重要,但它们的电特性和偏差稳定性对于实际应用至关重要.
- 积极偏差应力 (PBS) 的不稳定性会影响 TFT 的性能,因此必须了解其对初始值电压 (VTH) 的依赖.
研究的目的:
- 分析正偏应力 (PBS) 不稳定性在溶液处理氧化物TFT中对初始值电压 (VTH) 的依赖.
- 调查缓慢和快速陷对PBS不稳定性的作用.
- 了解 (Al) 在氧化 (InOx) 中的兴奋剂如何影响VTH和随后的偏差稳定性.
主要方法:
- 通过使用 (Al) 作为载体抑制剂进行兴奋剂来控制InOx TFTs的初始VTH.
- 分析了正倾向应力 (PBS) 的不稳定性及其与VTH的相关性.
- 研究恢复行为,以区分快速和慢速陷对VTH转移 (ΔVTH) 的影响.
主要成果:
- 增加的Al兴奋剂度减少了氧气空缺,导致InOx TFTs的阳性VTH转移.
- 由PBS引起的ΔVTH随着垂直电场影响的VTH增加而呈指数级增加.
- 随着VTH的正转移,慢陷对ΔVTH的贡献增加了,这表明电子陷位置偏离了接口.
结论:
- 兴奋剂有效地控制了最初的VTH,并减轻了InOx TFT中的PBS不稳定性.
- 该研究阐明了VTH,陷动态 (缓慢和快速的陷) 和PBS不稳定性之间的关系.
- 结果为优化氧化物TFT制造提供了洞察力,以提高电子应用中的稳定性.
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