在一维和二维半导体设备中调整 Schottky 屏障高度的调整方法
Jianping Meng1, Chengkuo Lee2, Zhou Li1
1Beijing Institute of Nanoenergy and Nanosystems, Chinese Academy of Sciences, Beijing 101400, China; School of Nanoscience and Engineering, University of Chinese Academy of Sciences, Beijing 100049, China.
本综述详细介绍了纳米半导体设备中调整 Schottky 屏障高度 (SBH) 的方法. 它涵盖了控制载体运输和设备性能的静态和动态技术.
科学领域:
- 材料科学 材料科学 材料科学
- 凝聚物质物理学 凝聚物质物理学
- 纳米技术纳米技术
背景情况:
- 肖特基接触是纳米半导体设备中的关键接口,控制载体运输.
- 施托基屏障高度 (SBH) 是一个影响设备操作和性能的关键参数.
- 控制SBH对于优化半导体设备至关重要.
研究的目的:
- 提供SBH调整的静态和动态方法的全面审查.
- 为突出纳米半导体设备SBH调整的最新进展.
- 讨论克服费米级固定效应的策略.
主要方法:
- 审查关于SBH调整技术的现有文献.
- 方法分析包括工作功能,接口状态,表面修改和外部刺激.
- 探索范德瓦尔斯和1D边缘金属接触,以减轻费米级钉钉.
主要成果:
- 确定了SBH调制的各种静态和动态方法.
- 讨论了工作功能,接口差距状态和外部领域对SBH的影响.
- 提出了克服费米级别固定的策略,例如范德瓦尔斯的联系人.
结论:
- 通过各种方法可以实现SBH的有效控制.
- 纳米设备的进步需要定制的SBH调整策略.
- 未来的研究应该专注于SBH控制和费米级固定缓解的新方法.
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