单层V_{2}MX_{4}:一个新的量子异常大厅绝缘体家族

Yadong Jiang1, Huan Wang1, Kejie Bao1

  • 1State Key Laboratory of Surface Physics and Department of Physics, Fudan University, Shanghai 200433, China.

PubMed
概括

我们理论上提出了一种新的量子异常霍尔绝缘体家族,V2MX4,具有很大的拓间隙和高基里温度. 这一发现可以推进拓量子物理学研究和应用.

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