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在光电阻体中,赫萨化醇增强了特殊的石版灵敏度

Junjun Liu¹, Dong Wang¹, Yitan Li¹

¹National Engineering Research Center for Colloidal Materials, School of Chemistry and Chemical Engineering, Shandong University, Jinan 250100, China.

|March 28, 2024

概括

这项研究引入了新型含有六化异醇 (HFIP) 的光电阻剂,用于高级光刻. 这些高灵敏度材料可以在没有传统光酸发生器 (PAG) 的情况下实现超高分辨率成像.

科学领域:

材料科学材料科学材料科学
纳米技术纳米技术
化学化学化学

背景情况:

先进的光刻要求高度敏感的光电阻,以提高效率.
开发高灵敏度光电阻和成像策略仍然是微电子制造的重大挑战.

研究的目的:

报告一种新的策略,用于实现光电阻剂的超高灵敏度,使用六化醇 (HFIP).
展示一种新的成像方法,可以绕过传统光酸生成器 (PAG) 的需求.

主要方法:

将HFIP纳入聚合物光电阻体,以利用其电友性质和的电子吸收效应.
使用电子束光刻技术评估含有HFIP的光电阻.

主要成果:

含有HFIP的光电阻显著增加光电阻暴露后的酸度,使无PAG成像成为可能.
通过电子束光刻技术,通过3μC/cm2的超低剂量达到~40nm的沟.
与基于PAG的商业系统相比,显示了大约10倍的灵敏度增强,突出显示了高灵敏度和分辨率.

结论:

开发的含有HFIP的光电阻体代表了一类新的无PAG成像材料.
这种新的方法为超越传统光电阻调节的增强成像性能提供了一条途径.
这些发现为更高效和更高分辨率的先进光刻技术铺平了道路.

关键词:

六氧化异醇和醇.具有高灵敏度的高灵敏度产生光酸的产生.摄影电阻的使用方法

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