通过在InGaN/GaN微型发光二极管中使用金属绝缘体半导体结构来提高效率
Jian Yin1, David Hwang2, Hossein Zamani Siboni2
1Department of Electrical and Computer Engineering, Waterloo Institute Nanotechnology, University of Waterloo, Waterloo, ON, N2L 3G1, Canada.
Frontiers of optoelectronics
|March 28, 2024
概括
研究人员为印化/化 (InGaN/GaN) 微型发光二极管 (微型LED) 开发了金属绝缘体半导体 (MIS) 结构. 将负偏差应用于侧墙电极可以通过控制表面重组来提高外部量子效率 (EQE).
科学领域:
- 半导体物理 半导体物理
- 光电学是指光电子产品.
- 材料科学 材料科学 材料科学
背景情况:
- 微型发光二极管 (微型LED) 对于先进的显示技术至关重要.
- 在InGaN/GaN微型LED的效率限制阻碍了广泛采用.
- 表面重组是影响微型LED性能的一个重要因素.
研究的目的:
- 在InGaN/GaN微型LED的侧墙上提出和研究一种新的金属绝缘体半导体 (MIS) 结构.
- 为了提高微LED的外部量子效率 (EQE).
- 了解控制MIS微LED中EQE的基本机制.
主要方法:
- 制造具有侧墙MIS结构的InGaN/GaN微LED.
- 微型LED上的电光发射 (EL) 测量,侧墙电极偏差有所变化.
- 带结构分析以阐明电场对表面重组的影响.
主要成果:
- 将负偏差应用于侧墙电极显著增加了10微米直径设备中的EQE.
- 侧墙电极上的正偏差导致EQE的下降.
- 带结构分析证实,侧墙电场调节表面电子密度并控制Shockley-Read-Hall (SRH) 重组.
结论:
- 侧墙MIS结构提供了一个可行的途径,以提高InGaN/GaN微型LED的效率.
- 通过电场调制控制表面重组是提高EQE的关键.
- 通过减少绝缘体厚度和探索替代材料,可以实现未来的改进.
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