嵌入核心绝缘器纳米板场效应晶体管用于抑制设备对设备的变化
Donghwi Son1, Hyunwoo Lee1, Hyunsoo Kim1
1Department of Electrical Engineering, Sejong University, Seoul, 05006, Korea.
Scientific reports
|March 30, 2024
概括
与核心绝缘器嵌入的纳米板场效应晶体管 (C-NSFETs) 与传统的纳米板场效应晶体管 (NSFETs) 相比,提供更高的性能和更低的可变性. 这一进步源于改进的门控和对制造变化的弹性.
科学领域:
- 半导体设备物理学 半导体设备物理
- 通过先进的晶体管技术,实现了先进的晶体管技术.
背景情况:
- 纳米板场效应晶体管 (NSFETs) 正在成为FinFETs的有希望的替代品,以提高性能和能源效率.
- 设备对设备 (D2D) 的变化仍然是NSFET扩展的关键挑战.
研究的目的:
- 研究内核绝缘体嵌入纳米板场效应晶体管 (C-NSFETs) 的性能和D2D可变性.
- 使用三维设备模拟,将C-NSFET与传统的NSFET进行比较.
主要方法:
- 使用三维设备模拟来分析C-NSFET的特性.
- 评估了关键绩效指标,如下值斜率和非电流.
- 评估了纳米板厚度和兴奋剂度变化的对器件可变性的影响.
主要成果:
- C-NSFETs表现出增强的直流 (DC) 性能,包括更的下值斜率和更低的下电流.
- 在关键结构和兴奋剂参数中,C-NSFET设计对D2D变异具有显著的弹性.
- 该研究强调了热氧化在形成核心绝缘层以达到最佳性能方面的关键作用.
结论:
- C-NSFETs为克服传统NSFETs的局限性提供了一个可行的途径,特别是在性能和可变性方面.
- 核心绝缘体结构有效地改善了门的静电控制,并减轻了制造引起的变化.
- 优化热氧化过程对于实现C-NSFET的全部潜力至关重要.
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