在结晶过程中的LiF-Li2B4O7薄膜结构中的新结构光学效应
Volodymyr Maslyuk1, Oksana Pop1, Vadym Holovey1
1Institute of Electron Physics, Uzhhorod, Ukraine.
概括
这项研究研究了光学辐射对纳米尺度 (LiF) x ((Li2B4O7) 1-x膜中的无形到晶相过渡的影响. 观察到热发光对薄膜厚度的敏感性,以及辐射和非辐射样本之间的差异.
科学领域:
- 材料科学 材料科学 材料科学
- 固态物理 固态物理
- 光学光谱学是指光学光谱学.
背景情况:
- 无形到晶体相位过渡是材料中的基本过程.
- 纳米尺度的片为研究相位过渡提供了独特的特性.
- 基于的化合物对于辐射剂量测量应用具有重要意义.
研究的目的:
- 为了研究光学辐射在无形阶段过渡到晶体阶段过渡期间的影响.
- 探索纳米级 (LiF) x ((Li2B4O7) 1-x 薄膜的热发光 (TL) 特性.
- 为了比较光学和电离辐射暴露后的TL特性.
主要方法:
- 制造纳米尺度 (LiF) x(Li2B4O7) 1-x薄膜通过在冷Ni基板上喷涂.
- 对热发光效应 (TL) 的研究.
- 使用来自M-30微 (1kGy剂量) 的6MeV制动辐射源进行辐射.
主要成果:
- 发现热发光效应对薄膜厚度敏感.
- 在光学处理和电离辐射辐射的膜之间观察到发光特性上的差异.
- 确定了与相位过渡相关的结构光学效应.
结论:
- 光学辐射影响纳米尺度片的相变.
- 热发光是一种可行的方法来表征这些转变和辐射效应.
- 这项研究揭示了这些材料中一种新的结构光学效应.
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