铁电领域墙壁延迟器和低放电调节器
1State Key Laboratory of ASIC & System, School of Microelectronics, Fudan University, Shanghai 200433, China.
ACS applied materials & interfaces
|April 2, 2024
概括
在酸薄膜上制造的域壁 (DW) 纳米设备提供了独立于电压的稳定输出电流. 这些紧型设备显示出对电源管理集成电路 (PMIC) 和神经网络的承诺.
科学领域:
- 材料科学 材料科学 材料科学
- 纳米技术 纳米技术
- 电气工程 电气工程
背景情况:
- 由于面积的限制,精确和稳定的功率转换器在系统芯片电源管理集成电路 (PMIC) 中是复杂的.
- 现有的解决方案在集成系统中难以应对线路/负载变化和电源波动.
研究的目的:
- 为先进的集成电路应用开发新的多功能纳米设备.
- 调查域墙 (DW) 纳米设备在紧和高效的电源管理和信号处理方面的潜力.
主要方法:
- 在上使用X切割的LiNbO3薄膜制造域壁 (DW) 纳米设备.
- 应用电压下域切换动态和输出电流行为的特征.
- 开发一个壁电流有限的域切换模型.
主要成果:
- 域名切换发生在延迟后,根据默兹定律可以预测.
- 输出电流独立于应用电压,但可以通过墙壁宽度和输入电阻进行调节.
- 在间歇电压下的接口域中观察到重复的调节电流.
结论:
- 多功能DW纳米设备为PMICs提供了紧的解决方案,可能作为低下降调节器.
- 这些设备适用于神经网络中的时间域延迟器和芯片上的静电放电保护.
- 开发的纳米设备为非挥发性记忆,选择器和其他集成电路组件提供了一个多功能平台.
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